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Ultra trace measurement of potassium and other elements in ultrapure water using the Agilent 8800 ICP-QQQ in cool plasma reaction cell mode

 

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Applications of ICP-MS Measuring Inorganic Impurities in Semiconductor Manufacturing Application Compendium > Return to table of contents > Search entire document Table of contents ICP-MS and ICP-QQQ in the Semiconductor Industry 4 Agilent Has Three Decades of ICP-MS Experience Driving…
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Application Note Semiconductor Ultrapure Process Chemicals Analysis by ICP-QQQ with Hot Plasma Conditions Meeting single- and sub-ppt guideline levels for ASTM/SEMI elements in ultrapure water using an Agilent 8900 ICP-QQQ Authors Kazuhiro Sakai and Yoshinori Shimamura Agilent Technologies, Inc. Introduction…
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5th Edition Handbook of ICP-QQQ Applications using the Agilent 8800 and 8900 Primer > Return to table of contents > Search entire document Foreword Agilent Technologies launched its 8800 Triple Quadrupole ICP-MS (ICP-QQQ) at the 2012 Winter Conference on Plasma…
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Improvement of ICP-MS detectability of phosphorus and titanium in high purity silicon samples using the Agilent 8800 Triple Quadrupole ICP-MS Application note Semiconductor Authors Junichi Takahashi Agilent Technologies, Tokyo, Japan Introduction In the past three decades monitoring and controlling metallic…
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