Determination of challenging elements in ultrapure semiconductor grade sulfuric acid by Triple Quadrupole ICP-MS
Aplikace
| 2015 | Agilent Technologies
ICP/MS, ICP/MS/MS
Instrumentace
ICP/MS, ICP/MS/MS
Výrobce
Agilent Technologies
Zaměření
Polovodiče
WCPS: Efficient Removal of Polyatomic Ions by ICP-MS Equipped with Novel Reaction Cell: Examples of Highly Purified Chemicals Used for Semiconductor
Postery
| 2012 | Agilent Technologies
ICP/MS, ICP/MS/MS
Instrumentace
ICP/MS, ICP/MS/MS
Výrobce
Agilent Technologies
Zaměření
Polovodiče
Determination of trace elements in ultrapure semiconductor grade sulfuric acid using the Agilent 8900 ICP-QQQ in MS/MS mode
Aplikace
| 2018 | Agilent Technologies
ICP/MS, ICP/MS/MS
Instrumentace
ICP/MS, ICP/MS/MS
Výrobce
Agilent Technologies
Zaměření
Polovodiče
Quantitative analysis of high purity metals using laser ablation coupled to an Agilent 7900 ICP-MS
Aplikace
| 2015 | Agilent Technologies
ICP/MS, Laserová ablace
Instrumentace
ICP/MS, Laserová ablace
Výrobce
Agilent Technologies
Zaměření
Průmysl a chemie, Polovodiče
Using ICP-MS/MS with M-Lens for the analysis of high silicon matrix samples
Postery
| 2020 | Agilent Technologies (ASMS)
ICP/MS, ICP/MS/MS
Instrumentace
ICP/MS, ICP/MS/MS
Výrobce
Agilent Technologies
Zaměření
Polovodiče
Direct Analysis of Photoresist and Related Solvents Using the Agilent 7500cs ICP-MS
Aplikace
| 2004 | Agilent Technologies
ICP/MS
Instrumentace
ICP/MS
Výrobce
Agilent Technologies
Zaměření
Polovodiče
WCPS: Ultratrace Analysis of Phosphorus, Boron and Other Impurities in Photovoltaic Silicon and Trichlorosilane by ICP-MS with High Energy Collision Cell
Postery
| 2011 | Agilent Technologies
ICP/MS
Instrumentace
ICP/MS
Výrobce
Agilent Technologies
Zaměření
Polovodiče
Analysis of Ultratrace Impurities in High Purity Copper using the Agilent 8900 ICP-QQQ
Aplikace
| 2018 | Agilent Technologies
ICP/MS, ICP/MS/MS
Instrumentace
ICP/MS, ICP/MS/MS
Výrobce
Agilent Technologies
Zaměření
Průmysl a chemie, Polovodiče
Analysis of Trace Metal Impurities in High Purity Hydrochloric Acid Using ICP-QQQ
Aplikace
| 2017 | Agilent Technologies
ICP/MS, ICP/MS/MS
Instrumentace
ICP/MS, ICP/MS/MS
Výrobce
Agilent Technologies
Zaměření
Polovodiče
Trace Elemental Analysis of Trichlorosilane by Agilent ICP-MS