Automated Surface Analysis of Metal Contaminants in Silicon Wafers by Online VPD-ICP-MS/MS
Aplikace
| 2023 | Agilent Technologies
ICP/MS, ICP/MS/MS
Instrumentace
ICP/MS, ICP/MS/MS
Výrobce
Agilent Technologies
Zaměření
Polovodiče
Characterization of Surface Metal Contamination on Silicon Wafers Using Surface Metal Extraction Inductively Coupled Plasma Mass Spectrometry (SME- ICP-MS)
Aplikace
| 2001 | Agilent Technologies
ICP/MS
Instrumentace
ICP/MS
Výrobce
Agilent Technologies
Zaměření
Polovodiče
Evaluation of the Mark-VI Spray Chamber for Flame Atomic Absorption Spectrometry
Technické články
| 2010 | Agilent Technologies
AAS
Instrumentace
AAS
Výrobce
Agilent Technologies
Zaměření
WCPS: Evaluation of a novel nebulizer using an inductively coupled plasma optical emission spectrometer
Postery
| 2011 | Agilent Technologies
ICP/OES
Instrumentace
ICP/OES
Výrobce
Agilent Technologies
Zaměření
Direct Analysis of Metallic Impurities in SiC and GaN Wafers by LA-GED-MSAG-ICP-MS/MS
Aplikace
| 2023 | Agilent Technologies
ICP/MS, ICP/MS/MS, Laserová ablace
Instrumentace
ICP/MS, ICP/MS/MS, Laserová ablace
Výrobce
Agilent Technologies
Zaměření
Polovodiče
Improvement of ICP-MS detectability of phosphorus and titanium in high purity silicon samples using the Agilent 8800 Triple Quadrupole ICP-MS
Aplikace
| 2013 | Agilent Technologies
ICP/MS, ICP/MS/MS
Instrumentace
ICP/MS, ICP/MS/MS
Výrobce
Agilent Technologies
Zaměření
Polovodiče
Onsite FTIR quantitative analysis of water in mineral-based oils using a novel water stabilization technique
Aplikace
| 2013 | Agilent Technologies
FTIR Spektroskopie
Instrumentace
FTIR Spektroskopie
Výrobce
Agilent Technologies
Zaměření
Průmysl a chemie
Analysis of High Solids Solutions by Flame Atomic Absorption