Novel Advancements in Trace Level Determination and Longterm Stability of Metals in TMAH and UPW matrices

As the needs of the semiconductor industry call for being able to measure metals at lower and lower concentrations, it is necessary to employ the best tune conditions for each of the metals of interest.

This means that multiple tune modes such as cool plasma, hot plasma, oxygen, ammonia, etc. are required when analyzing a full suite of elements thus necessitating the changing of RF power, positioning of the torch and gas flows within a single analysis.  Not only is it important to demonstrate the ability to achieve low detection limits within these methods but also to demonstrate long term stability as the instrument cycles back and forth through the various tune conditions from sample to sample.

We will show examples of this with TMAH and UPW matrices.

Presenter: Bert Woods (Application Scientist, Agilent Technologies, Inc.)

Joined the Agilent ICP-MS team in 2004, with previous employment in the semiconductor industry with Dominion Semiconductor (IBM/Toshiba) and Micron. Bert is a 1997 Chemistry graduate of Radford University in Virginia and an avid Washington DC Sports fan.