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Analysis of Metallic Impurities in Specialty Semiconductor Gases Using Gas Exchange Device (GED)-ICP-MS

 

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Application Note Semiconductor Direct Analysis of Metallic Impurities in SiC and GaN Wafers by LA-GED-MSAG-ICP-MS/MS Automated analysis using Agilent 8900 ICP-QQQ with Laser Ablation, Gas Exchange Device, and Metal Standard Aerosol Generation Authors Koshi Suzuki, Tatsu Ichinose, and Katsu Kawabata…
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5th Edition Handbook of ICP-QQQ Applications using the Agilent 8800 and 8900 Primer > Return to table of contents > Search entire document Foreword Agilent Technologies launched its 8800 Triple Quadrupole ICP-MS (ICP-QQQ) at the 2012 Winter Conference on Plasma…
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Applications of ICP-MS Measuring Inorganic Impurities in Semiconductor Manufacturing Application Compendium > Return to table of contents > Search entire document Table of contents ICP-MS and ICP-QQQ in the Semiconductor Industry 4 Agilent Has Three Decades of ICP-MS Experience Driving…
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Application Note Semiconductor Elemental and Particle Analysis of N-Methyl-2-Pyrrolidone (NMP) by ICP-MS/MS Analysis of dissolved and particulate inorganic impurities in two grades of NMP using the Agilent 8900 ICP-QQQ Author Introduction Yoshinori Shimamura Ideally, analytical quality control (QC) testing procedures…
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