Determination of Trace Impurities in Electronic Grade Arsine by GC-ICP-QQQ
Aplikace | 2020 | Agilent TechnologiesInstrumentace
GC, ICP/MS, Speciační analýza, ICP/MS/MS
ZaměřeníPolovodiče
VýrobceAgilent Technologies
Klíčová slovagermane, arsine, phosphine, silane, sulfide, icp, gas, hydrogen, integration, hydride, dopants, time, qqq, gallium, standard, area, dls, cell, interferences, semiconductor, kinetic, analyte, epilayers, used, discrimination, best, arsenide, argon, mass, limits, tune, using, entrainment, compounds, iii, appeal, multiplication, acquisition, modes, removal, single, dopant, contaminants, purity, dilution, impurities, measure, noise, deliberately, mode
Podobná PDF
Sub-ppb detection limits for hydride gas contaminants using GC-ICP-QQQ
2015|Agilent Technologies|Aplikace
Sub-ppb detection limits for hydride gas contaminants using GC-ICP-QQQ Application note Semiconductor and petrochemical Authors William Geiger CONSCI, Ltd., Pasadena, Texas, USA Emmett Soffey, Steve Wilbur and Chris Scanlon Agilent Technologies Inc., USA Introduction Hydride gases, such as phosphine and…
Klíčová slova
sulfide, sulfideicp, icpppb, ppbqqq, qqqcarbonyl, carbonylgas, gascell, cellphosphine, phosphinesilane, silanecos, cosomega, omegahydride, hydrideusing, usingsemiconductor, semiconductorpetrochemical
Agilent ICP-MS Journal (October 2020, Issue 82)
2020|Agilent Technologies|Ostatní
Agilent ICP-MS Journal October 2020, Issue 82 Agilent ICP-MS Methods for a Range of Contaminants Page 1 Agilent ICP-MS Methods for a Range of Contaminants Pages 2-3 GC-ICP-QQQ Method to Measure Trace Contaminants in Arsine Gas Used for III-V Compound…
Klíčová slova
icp, icpias, iassemiconductor, semiconductorqqq, qqqwebinar, webinarrice, riceagilent, agilentarsenic, arseniciii, iiisemiconductors, semiconductorslive, livefda, fdainorganic, inorganicarticles, articlesarsine
Measuring Inorganic Impurities in Semiconductor Manufacturing
2022|Agilent Technologies|Příručky
Applications of ICP-MS Measuring Inorganic Impurities in Semiconductor Manufacturing Application Compendium > Return to table of contents > Search entire document Table of contents ICP-MS and ICP-QQQ in the Semiconductor Industry 4 Agilent Has Three Decades of ICP-MS Experience Driving…
Klíčová slova
return, returncontents, contentstable, tableicp, icpcps, cpsppt, pptgas, gassemiconductor, semiconductorconc, concqqq, qqqbec, becdocument, documententire, entiresearch, searchmode
Agilent ICP-MS Journal (July/August 2015 – Issue 62)
2015|Agilent Technologies|Ostatní
Agilent ICP-MS Journal July/August 2015 – Issue 62 Inside this Issue 2-3 New! Solution-ready Agilent 7800 ICP-MS 4-5 Sub-ppb Detection Limits for Hydride Gas Contaminants using GC-ICP-QQQ 6 Agilent MAPs: Innovative New Services Benefit Customers in EMEAI 7 Software Tips…
Klíčová slova
icp, icpmaps, mapsagilent, agilentphosphine, phosphinepolyatomic, polyatomiccustomers, customershydride, hydridenew, newqqq, qqqnanoparticle, nanoparticleemeai, emeaimatrix, matrixmany, manylimits, limitsanalysis