Sub-ppb detection limits for hydride gas contaminants using GC-ICP-QQQ
Aplikace | 2015 | Agilent TechnologiesInstrumentace
GC, Speciační analýza, ICP/MS/MS
ZaměřeníPrůmysl a chemie, Polovodiče
VýrobceAgilent Technologies
Klíčová slovasulfide, icp, ppb, qqq, gas, carbonyl, cell, phosphine, silane, cos, omega, hydride, using, semiconductor, low, petrochemical, exit, level, scanlon, anticipation, calibration, geiger, were, supplied, oxygen, transistors, value, diluter, standard, integration, hydrogen, industry, contaminants, mass, purity, production, measuring, demanded, multipoint, william, based, backgrounds, deleterious, reaction, performance, either, used, background, qms, dynamically
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2015|Agilent Technologies|Ostatní
Agilent ICP-MS Journal July/August 2015 – Issue 62 Inside this Issue 2-3 New! Solution-ready Agilent 7800 ICP-MS 4-5 Sub-ppb Detection Limits for Hydride Gas Contaminants using GC-ICP-QQQ 6 Agilent MAPs: Innovative New Services Benefit Customers in EMEAI 7 Software Tips…
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Application Note Semiconductor Determination of Trace Impurities in Electronic Grade Arsine by GC-ICP-QQQ Sub-ppb detection limits for hydride gas contaminants using a single column, single injection volume, and multi-tune method Authors Introduction William M. Geiger, Blake McElmurry, Jesus Anguiano1 Mark…
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Applications of ICP-MS Measuring Inorganic Impurities in Semiconductor Manufacturing Application Compendium > Return to table of contents > Search entire document Table of contents ICP-MS and ICP-QQQ in the Semiconductor Industry 4 Agilent Has Three Decades of ICP-MS Experience Driving…
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CHEMICAL & ENERGY ANALYSIS ANALYSIS OF PROPYLENE IMPURITIES USING SELECT LOW SULFUR COLUMN AND SINGLE TUNE WITH GC-ICP-MS QQQ ORS Solutions for Your Analytical Business Markets and Applications Programs Author William M. Geiger Blake McElmurry Jesus Anguiano CONSCI, Ltd. Pasadena,…
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