Ultratrace Element Analysis By ICP-MS/MS Under Robust Conditions Using Ion Optic Lenses
To maintain performance and production yields of semiconductor devices with ever smaller linewidths, control of elemental impurities in process chemicals used in fabrication (FAB) facilities remains a highly critical application.
ASTM D5127-13, 2018 and SEMI F63-0521, 2021 standards provide guidance for industry on the quality of ultrapure water (UPW) needed to produce devices with linewidths < 0.045 microns. Both standards require detection limits (DLs) of less than 0.5 ppt (boron has a higher limit of 15 ppt) and background equivalent concentrations (BECs) less than 1 ppt (50 ppt for B) for a wide range of elements. To meet the stringent standards, the industry is increasingly using triple quadrupole ICP-MS (ICP-QQQ or ICP-MS/MS) for the ultratrace analysis of process chemicals because of its high detection power and flexible operating conditions. Results generated using an ICP-MS/MS method for the Agilent 8900 ICP-QQQ will be presented for the measurement of 26 SEMI-critical elements in low-matrix semiconductor reagents. The instrument was fitted with an optional ion optic ‘m-lens’ designed to minimize background signals from easily ionized elements (EIEs) such as Na, Ba, and Li. The configuration allowed all elements to be measured at ppt levels using robust, hot plasma conditions (CeO/Ce ratio <2%). Details will be provided on the interference removal methods used to achieve sub-ppt level BECs for SEMI elements, including critical metallic (conductive) contaminants such as Al, Cr, Fe, Co, Ni, Cu, Zn, and Mo.
Presenter: Bert Woods (Application Scientist, Agilent Technologies, Inc.)
Joined the Agilent ICP-MS team in 2004, with previous employment in the semiconductor industry with Dominion Semiconductor (IBM/Toshiba) and Micron. Bert is a 1997 Chemistry graduate of Radford University in Virginia and an avid Washington DC Sports fan.
Presenter: Abe Gutierrez (Product Specialist, Agilent Technologies, Inc.)
Abe is an Agilent Product Specialist with nearly 30 years’ experience with ICP-MS. Abe started as an applications chemist in the semiconductor industry and moved to Agilent/HP in 1996. Abe is a technical resource supporting the Agilent sales organization.
