Metallic Impurity Analysis in Ultra-Pure N-Methyl Pyrrolidone (NMP) with the NexION 5000 ICP-MS
Join us for an in-depth look at how the NexION 5000 multi-quadrupole ICP-MS revolutionizes the detection of metallic impurities in ultra-pure N-Methyl Pyrrolidone (NMP), a critical solvent for semiconductor fabrication. The NexION 5000 enables precise, interference-free analysis of trace elements, meeting the rigorous demands of the semiconductor industry.
Learn how advanced innovations like reaction mode technology and enhanced signal-to-background ratios ensure unparalleled sensitivity and accuracy for your quality control needs
HIGHLIGHTS
- How NexION 5000 enables direct analysis of organic solvents, eliminating the need for complex pretreatment methods.
- Key advantages of multi-quadrupole technology in removing spectral interferences for trace element detection.
- Detailed insights into achieving sub-ppt detection limits for 37 metallic impurities in semiconductor-grade NMP.
- Best practices for ensuring contamination-free results and optimizing analytical performance.
Presenter: Aaron Hineman (Atomic Spectroscopy Product Line Leader)
Aaron Hineman is the Atomic Spectroscopy Product Line Leader at PerkinElmer, with over 25 years of experience in analytical chemistry and a strong background in atomic spectroscopic technologies.
