Determination of trace elements in ultrapure semiconductor grade sulfuric acid using the Agilent 8900 ICP-QQQ in MS/MS mode
Aplikace | 2018 | Agilent TechnologiesInstrumentace
ICP/MS, ICP/MS/MS
ZaměřeníPolovodiče
VýrobceAgilent Technologies
Klíčová slovamode, icp, cell, sulfuric, semiconductor, polyatomic, elements, ions, ion, shift, analyte, product, wafer, mass, avoided, problematic, piranha, slow, axial, qqq, engergy, implantation, trace, ultrapure, from, kazuo, elemental, removed, kanto, encourages, interference, element, yamanaka, interferences, grade, using, impurities, forty, hinder, collisions, suffering, chemicals, tipped, plasma, backgrounds, reaction, surface, qms, spectral, shifting
Podobná PDF
Measuring Inorganic Impurities in Semiconductor Manufacturing
2022|Agilent Technologies|Příručky
Applications of ICP-MS Measuring Inorganic Impurities in Semiconductor Manufacturing Application Compendium > Return to table of contents > Search entire document Table of contents ICP-MS and ICP-QQQ in the Semiconductor Industry 4 Agilent Has Three Decades of ICP-MS Experience Driving…
Klíčová slova
return, returncontents, contentstable, tableicp, icpcps, cpsppt, pptgas, gassemiconductor, semiconductorconc, concqqq, qqqbec, becdocument, documententire, entiresearch, searchmode
Handbook of ICP-QQQ Applications using the Agilent 8800 and 8900
2022|Agilent Technologies|Příručky
5th Edition Handbook of ICP-QQQ Applications using the Agilent 8800 and 8900 Primer > Return to table of contents > Search entire document Foreword Agilent Technologies launched its 8800 Triple Quadrupole ICP-MS (ICP-QQQ) at the 2012 Winter Conference on Plasma…
Klíčová slova
return, returncontents, contentstable, tableicp, icpqqq, qqqcps, cpsgas, gasmass, masscell, cellppt, pptdocument, documentconc, concentire, entiresearch, searchelements
Agilent ICP-MS Journal (December 2016 – Issue 67)
2016|Agilent Technologies|Ostatní
Agilent ICP-MS Journal December 2016 – Issue 67 Inside this Issue 2-3 Determination of Ultra Trace Elements in High Purity Sulfuric Acid and Hydrogen Peroxide using ICP-QQQ 4-5 Sulfur Isotope Ratio Analysis in Mineral Waters using ICP-QQQ 5 Environmental Inorganic…
Klíčová slova
icp, icpqqq, qqqsulfur, sulfurppt, pptmineral, mineralelements, elementsisotope, isotopeagilent, agilentsulfuric, sulfuricsemiconductor, semiconductortestimonial, testimonialeuropean, europeantrace, tracebias, biasmore
Analysis of Trace Metal Impurities in High Purity Hydrochloric Acid Using ICP-QQQ
2017|Agilent Technologies|Aplikace
Application Note Semiconductor Analysis of Trace Metal Impurities in High Purity Hydrochloric Acid Using ICP-QQQ Authors Kazuo Yamanaka and Kazuhiro Sakai Agilent Technologies, Japan Introduction Hydrochloric acid (HCl) is a component of the standard RCA cleaning process used to remove…
Klíčová slova
icp, icpgas, gashcl, hclqqq, qqqqms, qmscrc, crchydrochloric, hydrochloricions, ionspurity, puritycool, coolimpurities, impuritiesbecs, becsmode, modeomega, omegadls