Determination of Ultratrace Impurities in Semiconductor Photoresist Using ICP-MS/MS
Aplikace | 2023 | Agilent TechnologiesInstrumentace
ICP/MS, ICP/MS/MS
ZaměřeníPolovodiče
VýrobceAgilent Technologies
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Measuring Inorganic Impurities in Semiconductor Manufacturing
2022|Agilent Technologies|Příručky
Applications of ICP-MS Measuring Inorganic Impurities in Semiconductor Manufacturing Application Compendium > Return to table of contents > Search entire document Table of contents ICP-MS and ICP-QQQ in the Semiconductor Industry 4 Agilent Has Three Decades of ICP-MS Experience Driving…
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Ultrapure Process Chemicals Analysis by ICP-QQQ with Hot Plasma Conditions
2021|Agilent Technologies|Aplikace
Application Note Semiconductor Ultrapure Process Chemicals Analysis by ICP-QQQ with Hot Plasma Conditions Meeting single- and sub-ppt guideline levels for ASTM/SEMI elements in ultrapure water using an Agilent 8900 ICP-QQQ Authors Kazuhiro Sakai and Yoshinori Shimamura Agilent Technologies, Inc. Introduction…
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Handbook of ICP-QQQ Applications using the Agilent 8800 and 8900
2022|Agilent Technologies|Příručky
5th Edition Handbook of ICP-QQQ Applications using the Agilent 8800 and 8900 Primer > Return to table of contents > Search entire document Foreword Agilent Technologies launched its 8800 Triple Quadrupole ICP-MS (ICP-QQQ) at the 2012 Winter Conference on Plasma…
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Analysis of Ultratrace Impurities in High Silicon Matrix Samples by ICP-QQQ
2021|Agilent Technologies|Aplikace
Application Note Semiconductor Analysis of Ultratrace Impurities in High Silicon Matrix Samples by ICP-QQQ Determination of 38 elements in high matrix samples using an Agilent 8900 ICP-QQQ with optional m-lens Authors Introduction Yu Ying Agilent Technologies (China) Co., Ltd. Rapid…
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