Ultrapure Process Chemicals Analysis by ICP-QQQ with Hot Plasma Conditions

Aplikace | 2021 | Agilent TechnologiesInstrumentace
ICP/MS, ICP/MS/MS
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Agilent Technologies
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Applications of ICP-MS Measuring Inorganic Impurities in Semiconductor Manufacturing Application Compendium > Return to table of contents > Search entire document Table of contents ICP-MS and ICP-QQQ in the Semiconductor Industry 4 Agilent Has Three Decades of ICP-MS Experience Driving…
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Agilent ICP-MS Journal (August 2021, Issue 85)
2021|Agilent Technologies|Ostatní
Agilent ICP-MS Journal August 2021, Issue 85 Optimizing ICP-MS Methods and Performance Page 1 Optimizing ICP-MS Methods and Performance Pages 2-3 Analysis of Impurities in Ultrapure Water Using Agilent 8900 ICP-QQQ with Hot Plasma and m-Lens Pages 4-5 Space Charge…
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Application Note Semiconductor Determination of Ultratrace Impurities in Semiconductor Photoresist Using ICP-MS/MS Monitoring 20 elemental contaminants in IC photoresist by Agilent 8900 ICP-QQQ after simple dilution in PGMEA solvent Authors Introduction Yu Ying, Xiangcheng Zeng, Juane Song With the rapid…
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Application Note Semiconductor Automated Analysis of Semiconductor Grade Hydrogen Peroxide and DI Water using ICP-QQQ Online MSA calibration using prepFAST S automated sample introduction and Agilent 8900 ICP-QQQ Authors Kazuhiro Sakai Agilent Technologies, Japan Austin Schultz Elemental Scientific, USA Introduction…
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