Determination of Trace Impurities in High-Purity Copper by Sequential ICP-OES with Axial Viewing
Aplikace | 2010 | Agilent TechnologiesInstrumentace
ICP/OES
ZaměřeníPrůmysl a chemie
VýrobceAgilent Technologies
Klíčová slovaviewing, plasma, lines, emission, copper, inductively, icp, oes, purity, radial, atomic, axial, axially, used, background, correction, objects, coupled, usable, flame, trace, viewed, impurities, bronzes, coppers, graphite, antiquities, sequential, analysis, nonspectral, instrumental, limits, were, found, matching, validated, high, chamber, effected, actual, usually, archaeological, spray, liberty, rsdb, elements, interferences, ancient, determination, certified
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